Epitaxial growth of MgO and Fe/MgO/Fe magnetic tunnel junctions on (100)-Si by molecular beam epitaxy


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Output typeJournal article

Author listMiao GX, Chang JY, van Veenhuizen MJ, Thiel K, Seibt M, Eilers G, Muenzenberg M, Moodera JS

PublisherAmerican Institute of Physics

Publication year2008

JournalApplied Physics Letters (0003-6951)

Volume number93

Issue number14

ISSN0003-6951

eISSN1077-3118

LanguagesEnglish-Great Britain (EN-GB)


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Open access statusclosed


Abstract

Epitaxial growth of MgO barrier on Si is of technological importance due to the symmetry filtering effect of the MgO barrier in conjunction with bcc-ferromagnets. We study the epitaxial growth of MgO on (100)-Si by molecular beam epitaxy. MgO matches Si with 4:3 cell ratio, which renders Fe to be 45 degrees rotated relative to Si, in sharp contrast to the direct epitaxial growth of Fe on Si. The compressive strains from Si lead to the formation of small angle grain boundaries in MgO below 5 nm, and also affect the transport characteristics of Fe/MgO/Fe magnetic tunnel junctions formed on top. (C) 2008 American Institute of Physics. [DOI: 10.1063/ 1.2999633]


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Last updated on 2025-17-07 at 03:02